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光刻机/微纳加工 > 美OAI紫外光刻机
 
Model 6020S 面板掩膜光刻机
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OAI的面板级掩模光刻机 Model 6020S, 用于FOPLP型号6020S -半自动化或自动化,实现500mm x 500mm晶圆尺寸的FO-PLP加工.

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 OAI的面板级掩模光刻机 Model 6020S

用于FOPLP型号6020S -半自动化或自动化,
实现500mm x 500mm晶圆尺寸的FO-PLP加工.

 

OAI’s Panel Level Mask Aligner for FOPLP Model 6020S - Semi or Automated

Enabling FO-PLP Processing at 500mm x 500mm Wafer Sizes


 

OAI掩模对准器,不同的印刷方式

 

距离: 间隙可设置在一个非常宽的范围内,增量精度1µM

软接触: •基材被带入非常柔软的机械接触曝光时的掩模。通过接触力可调软件设置

金属触点: •接触额外的氮气压力

真空接触: •真空级别控制接触力。真空度为由用户设置


OAI Mask Aligners
Various Printing Modes


PROXIMITY: 
• THE GAP IS SETTABLE OVER A VERY WIDE RANGE WITH AN  INCREMENTAL PRECISION OF 1µM 

SOFT CONTACT: 
• SUBSTRATE IS BROUGHT INTO VERY SOFT MECHANICAL CONTACT WITH THE MASK DURING EXPOSURE. THE CONTACT FORCE IS ADJUSTABLE VIA  SOFTWARE SETTINGS

HARD CONTACT:
• CONTACT WITH ADDITIONAL N2 pressure VACUUM CONTACT: 
• VACUUM LEVEL CONTROLS THE CONTACT FORCE. LEVEL OF VACUUM IS SET BY USER

 

afer Sizes

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