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光刻机/微纳加工 > ParcanNano德国针尖电子束光刻机
 
工业型原子力显微系统
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ParcanNano百及纳米工业型原子力显微系统可集成大尺寸样品位移台、全自动光学导航系统和配套自动控制软件,可对大尺寸样品 进行全方位的光学成像定位,根据光学成像结果自动标定多个精确测量区域,并根据缺陷/待测结构的特点进行模式识别,智能选取原子力显微镜测量参数,在样品多个位置间自动移动,进行可 重复的高分辨率测量,生成检测书面报告,整个过程无需人工参与,最终实现对大尺寸样品形貌 的智能化、自动化的高速、高效、高质量纳米级测量。    

 
 

 

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ParcanNano百及纳米工业型原子力显微系统

 

  基于全球独家专利的、源自德国的主动式探针技术,百及纳米科技开发了下一代工业智能型原子力显微镜系统,针对工业领域应用提供快速、智能的样品形貌表征,适用于工业型检错、质量评定和量化测量等,尤其适用于检测大尺寸晶圆或光学晶圆。  

 

 

系统可集成大尺寸样品位移台、全自动光学导航系统和配套自动控制软件,可对大尺寸样品 进行全方位的光学成像定位,根据光学成像结果自动标定多个精确测量区域,并根据缺陷/待测结构的特点进行模式识别,智能选取原子力显微镜测量参数,在样品多个位置间自动移动,进行可 重复的高分辨率测量,生成检测书面报告,整个过程无需人工参与,最终实现对大尺寸样品形貌 的智能化、自动化的高速、高效、高质量纳米级测量。    

 

 

 

 

扫描结果示例:

扫描速率:6 mm/s

扫描范围:510mm x 135mm

 

 

 

单次成像面积: 505 mm ×130 mm

结构高度: 60 nm

 

ParcanNano 100 nano industrial atomic force microscopy system

 

Based on the global patent home alone, from Germany active probe technology, best and nano science and technology to develop the next generation industrial system, intelligent atomic force microscope for industrial application provides a quick and intelligent the CLSM characterization, suitable for industrial inspection, quality evaluation and quantitative measurement of fault, especially suitable for detection of large size wafer or optical wafers.

 

System can be integrated displacement of large size sample machine, automatic optical navigation system and form a complete set of automatic control software, can be a full range of optical imaging of large size samples, according to the results of the optical imaging automatic calibration more accurate measurement area, and according to the characteristics of the defect/structures under test for pattern recognition, intelligent selection of atomic force microscope measurement parameters, It automatically moves between multiple locations of samples, carries out repeatable high-resolution measurements, and generates written test reports. The whole process requires no manual participation, and finally realizes intelligent, automated, high-speed, efficient and high-quality nanoscale measurement of large-size sample morphology.

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