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光刻机/微纳加工 > OAI美 紫外光刻机
 
OAI 800 MBA 型光学正面和背面光刻机系统
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OAI  800型光学正面和背面光刻机系统, 是半自动,four-camera、光学正面和背面光刻机。它提供极其精确的(1碌m - 2 m碌)对准精度,旨在大大超过任何红外背后对准器性能的一个非常有竞争力的价格。通用模型800光刻机是理想的用于低产量、研发实验室和大学。

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OAI 800 MBA 光学正面和背面光刻机系统

 

OAI模型800光刻机是半自动,four-camera、光学正面和背面光刻机。它提供极其精确的(1碌m - 2 m碌)对准精度,旨在大大超过任何红外背后对准器性能的一个非常有竞争力的价格。通用模型800光刻机是理想的用于低产量、研发实验室和大学。

模型800光刻机配置了各种各样的的OAI紫外线光源,在权力范围2千瓦。光刻机工具可以容纳基质8英寸广场,以及晶片卡盘定位允许方便装卸。这个划算的光刻机还包括机动背后焦点,电动汽车水准和汽车差距设置。
建立在隔振平台,固定器总成担保的固定不变的面具对准精度和可重复性。使用易读的操作简化,PLC触摸屏。培训时间短,操作员可以有效地学习使用光刻机在不到一个小时。

 

Model 800 Optical Front and Backside Mask Aligner System

The OAI Model 800 Mask Aligner is a semi-automated, four-camera, optical front and backside mask Aligner. It delivers ultra-precise (1碌m-2碌m) alignment accuracy and is designed to greatly surpass the performance of any IR backside Aligner at an extremely competitive price. The versatile Model 800 mask Aligner is ideal for use in low volume production, R&D labs, and universities.

The Model 800 Mask Aligner is configured with a wide variety of OAI UV light sources that range in power up to 2KW. The mask Aligner tooling can accommodate substrates up to 8-inch square, and the wafer chuck is positioned to allow for easy loading and unloading. This cost-effective mask Aligner also features motorized backside focus, motorized auto leveling and auto gap setting.

Built on a vibration isolation platform, the fixed mask holder assembly guarantees alignment accuracy and repeatability. Operation is simplified using the easy-to-read, PLC touch-screen. Training time is short; an operator can learn to use the mask Aligner effectively in less than one hour.

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