中文
|
EN
产品分类
联系我们
地址:深圳市宝安区沙井街道共和第四工业区昊海弘工业园A6栋7楼
电话:0755-29698758, 81776600,81779891
廖总:13538131258 QQ:583129932
网站:www.lxyee.net
邮箱:johny.liao@lxyee.net
光刻机/微纳加工 > 美OAI紫外光刻机
 
Model 800E 型掩模对准系统
*姓名:
*手机/微信:
*单位:
*邮箱:
*内容:
*验证码:

OAI Model 800E 型掩模对准系统,各种光谱范围选项:Hg灯:G(436nm),H(405nm), I(365nm)和310nm线,Hg-Xe灯:260nm和220nm

咨询购买
产品详情

OAI Model 800E 型掩模对准系统

 

。各种光谱范围选项:Hg灯:G(436nm),H(405nm), I(365nm)和310nm线,Hg-Xe灯:260nm和220nm

。基片尺寸范围从4“8”直径

。灯功率范围从200到2000W或LED

。电脑操作和配方存储

。易于使用的GUI和多功能操纵杆

。手动对齐在顶部和底部双2 mp GigE摄像机和机动的X-Y-Z-Theta舞台与操纵杆/菜谱操作

。升级到自动对齐w / Cognex软件升级

。楔自动补偿和机动z轴带有编码器和3点水准升级选项

。红外光学背面对齐选择升级

接近(20um): 3.0um,软触点:2.0um,硬触点:1um,真空触点:≤0.5um

。提供正面和背面接触和对齐0.5 - 1的准确性

。提供半自动化/研发和低容量生产模式

。适用于MEMS、半导体、Microfludic纳米印记,PSS衬底和CLiPP流程

 

 

Model 800E Mask Aligner System


。 Various Spectra Range Options: Hg Lamp: G (436nm), H (405nm), I(365nm) and 310nm lines, Hg-Xe Lamp:    260nm and 220nm
。 Substrate sizes range from 4” to 8” diameter or square
。 Lamp Power range from 200 to 2,000W or LED
。 PC Operation and Recipe Storage
。 Easy to use GUI and Multifunction Joystick
。 Manual Alignment with Top and Bottom Dual 2MP GigE Cameras and Motorized X-Y-Z-Theta Stage with Joystick / Recipe Operation
。 Upgrade to Auto Alignment w/ Cognex Software Upgrade
。 Automated wedge compensation and motorized z-axis with encoder and option for 3 Point Leveling Upgrade
。 IR Optics Backside Alignment Option upgrade
。 Proximity (20um): <3.0um, Soft Contact: <2.0um, Hard contact: 1um and vacuum contact : ≤ 0.5um
。 Provides Front and backside exposure and alignment accuracy of 0.5-1um
。 Available in semi automated / R&D and low volume production modes
。 Applicable for MEMS, Semiconductor, Microfludic, NanoImprinting, PSS Substrate and CLiPP Processes

Copyright © 2019 深圳市蓝星宇电子科技有限公司 All Rights Reserved  粤ICP备12009628号    |    友情链接(旧版网站)